AG

Andrew M Geiger

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #3 of 17Top 20%
📍 Newark, DE: #43 of 177 inventorsTop 25%
🗺 Delaware: #255 of 728 inventorsTop 40%
Overall (2011): #353,924 of 364,097Top 100%
1
Patents 2011

Issued Patents 2011

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
7947098 Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects John Esbenshade, Paul Libbers, Samuel J. November, Paul J. Sacchetti, Jonathan Tracy +2 more 2011-05-24