Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8059885 | Calculating image intensity of mask by decomposing Manhattan polygon based on parallel edge | Jaione Tirapu-Azpiroz, Kafai Lai, David O. S. Melville, Alan E. Rosenbluth | 2011-11-15 |
| 8056023 | Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask | Tadanobu Inoue, David O. Melville, Hidemasa Muta, Masahura Sakamoto, Alan E. Rosenbluth | 2011-11-08 |
| 8056026 | Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic mask | Tadanobu Inoue, David O. Melville, Hidemasa Muta, Masahura Sakamoto, Alan E. Rosenbluth | 2011-11-08 |
| 8028254 | Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale | Tadanobu Inoue, David O. Melville, Hidemasa Muta, Masaharu Sakamoto, Alan E. Rosenbluth | 2011-09-27 |
| 7969554 | Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images | David O. Melville, Alan E. Rosenbluth | 2011-06-28 |
| 7944545 | High contrast lithographic masks | Saeed Bagheri, David O. S. Melville, Alan E. Rosenbluth | 2011-05-17 |