Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8056023 | Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask | Tadanobu Inoue, Hidemasa Muta, Kehan Tian, Masahura Sakamoto, Alan E. Rosenbluth | 2011-11-08 |
| 8056026 | Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic mask | Tadanobu Inoue, Hidemasa Muta, Kehan Tian, Masahura Sakamoto, Alan E. Rosenbluth | 2011-11-08 |
| 8028254 | Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale | Tadanobu Inoue, Hidemasa Muta, Kehan Tian, Masaharu Sakamoto, Alan E. Rosenbluth | 2011-09-27 |
| 7969554 | Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images | Alan E. Rosenbluth, Kehan Tian | 2011-06-28 |