Issued Patents 2011
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8048593 | Mask blank substrate, mask blank, photomask, and methods of manufacturing the same | — | 2011-11-01 |
| 8039178 | Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks | Masaru Mitsui | 2011-10-18 |
| 8026025 | Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method | — | 2011-09-27 |
| 8007961 | Mask blank substrate set and mask blank set | — | 2011-08-30 |
| 7998644 | Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method | Osamu Suzuki, Hiroyuki Akagawa, Atsushi Kawaguchi, Naozumi Ishibashi | 2011-08-16 |
| 7972702 | Defect inspection method for a glass substrate for a mask blank, glass substrate for a mask blank, mask blank, exposure mask, method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing an exposure mask | — | 2011-07-05 |
| 7901840 | Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method | — | 2011-03-08 |
| 7898650 | Inspection method for transparent article | — | 2011-03-01 |
| 7892708 | Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method | Atsushi Kawaguchi, Hiroyuki Akagawa, Akihiro Kawahara | 2011-02-22 |
| 7862960 | Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks | Masaru Mitsui | 2011-01-04 |