HK

Hiromi Kanda

FU Fujifilm: 7 patents #23 of 996Top 3%
📍 Nanbu, JP: #4 of 153 inventorsTop 3%
Overall (2011): #8,595 of 364,097Top 3%
7
Patents 2011

Issued Patents 2011

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
8080363 Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin 2011-12-20
8039197 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same Haruki Inabe 2011-10-18
8034537 Positive resist composition and pattern forming method Toshiaki Fukuhara, Shinichi Kanna 2011-10-11
7998654 Positive resist composition and pattern-forming method Fumiyuki Nishiyama 2011-08-16
7947421 Positive resist composition for immersion exposure and pattern-forming method using the same 2011-05-24
7906268 Positive resist composition for immersion exposure and pattern-forming method using the same Haruki Inabe, Shinichi Kanna 2011-03-15
7892722 Pattern forming method Haruki Inabe, Shinichi Kanna 2011-02-22