Issued Patents 2011
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7995185 | Systems and methods for thermally-induced aberration correction in immersion lithography | Harry Sewell, Louis John Markoya | 2011-08-09 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7995185 | Systems and methods for thermally-induced aberration correction in immersion lithography | Harry Sewell, Louis John Markoya | 2011-08-09 |