Issued Patents 2005
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6964838 | Positive photoresist composition | Masaki Kurihara, Takako Suzuki, Kenji Maruyama, Satoshi Niikura | 2005-11-15 |
| 6939926 | Phenol novolak resin, production process thereof, and positive photoresist composition using the same | Ken Miyagi, Yasuhide Ohuchi, Atsuko Hirata, Hidekatsu Kohara, Toshimasa Nakayama | 2005-09-06 |
| 6884566 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Hidekatsu Kohara | 2005-04-26 |
| 6869742 | Positive photoresist composition | Jyunichi Mizuta, Kouji Yonemura, Akira Katano, Satoshi Niikura | 2005-03-22 |