Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6939926 | Phenol novolak resin, production process thereof, and positive photoresist composition using the same | Ken Miyagi, Yasuhide Ohuchi, Atsuko Hirata, Kousuke Doi, Toshimasa Nakayama | 2005-09-06 |
| 6884566 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi | 2005-04-26 |