KL

Keng-Chu Lin

TSMC: 1 patents #198 of 851Top 25%
📍 Lileng, TW: #1 of 1 inventorsTop 100%
Overall (2005): #159,864 of 245,428Top 70%
1
Patents 2005

Issued Patents 2005

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6846756 Method for preventing low-k dielectric layer cracking in multi-layered dual damascene metallization layers Shing-Chyang Pan, Wen-Chih Chiou, Shwang-Ming Jeng 2005-01-25