Issued Patents 2005
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6946235 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more | 2005-09-20 |
| 6933095 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura +4 more | 2005-08-23 |
| 6916592 | Esters, polymers, resist compositions and patterning process | Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more | 2005-07-12 |
| 6878501 | Polymer, chemically amplified resist composition and patterning process | Jun Hatakeyama, Jun Watanabe | 2005-04-12 |
| 6875556 | Resist compositions and patterning process | Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more | 2005-04-05 |
| 6872514 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more | 2005-03-29 |
| 6866983 | Resist compositions and patterning process | Jun Hatakeyama, Yoshio Kawai | 2005-03-15 |
| 6864037 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura +4 more | 2005-03-08 |
| 6861197 | Polymers, resist compositions and patterning process | Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +5 more | 2005-03-01 |
| 6855477 | Chemically amplified resist compositions and patterning process | Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more | 2005-02-15 |