TC

T. Todd Crkvenac

RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #6 of 29Top 25%
📍 Hockessin, DE: #10 of 63 inventorsTop 20%
🗺 Delaware: #72 of 524 inventorsTop 15%
Overall (2005): #33,484 of 245,428Top 15%
2
Patents 2005

Issued Patents 2005

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6899602 Porous polyurethane polishing pads Clyde A. Fawcett, Kenneth A. Prygon, Bernard Foster 2005-05-31
6843709 Chemical mechanical polishing method for reducing slurry reflux Jeffrey James Hendron, Gregory P. Muldowney 2005-01-18