CF

Clyde A. Fawcett

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #13 of 29Top 45%
📍 Claymont, DE: #1 of 5 inventorsTop 20%
🗺 Delaware: #155 of 524 inventorsTop 30%
Overall (2005): #221,049 of 245,428Top 95%
1
Patents 2005

Issued Patents 2005

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6899602 Porous polyurethane polishing pads T. Todd Crkvenac, Kenneth A. Prygon, Bernard Foster 2005-05-31