SI

Shigeyuki Iwasa

NE Nec: 4 patents #5 of 878Top 1%
📍 Tokyo, MO: #13 of 78 inventorsTop 20%
Overall (2005): #9,474 of 245,428Top 4%
4
Patents 2005

Issued Patents 2005

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
6924079 Resist resin, chemical amplification type resist, and method of forming of pattern with the same Katsumi Maeda, Kaichiro Nakano, Etsuo Hasegawa 2005-08-02
6893775 Battery having active material containing neutral carbon radical compound Yukiko Morioka, Masaharu Satoh, Yutaka Bannai, Kentaro Nakahara 2005-05-17
6866964 Secondary battery Kentaro Nakahara, Masaharu Satoh, Hiroshi Yageta, Yutaka Bannai, Yukiko Morioka +1 more 2005-03-15
6849384 Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions Katsumi Maeda, Kaichiro Nakano, Etsuo Hasegawa 2005-02-01