Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6924079 | Resist resin, chemical amplification type resist, and method of forming of pattern with the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2005-08-02 |
| 6849384 | Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions | Shigeyuki Iwasa, Katsumi Maeda, Etsuo Hasegawa | 2005-02-01 |