Issued Patents 2005
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6981240 | Cutting patterns for full phase shifting masks | Michel Cote | 2005-12-27 |
| 6978436 | Design data format and hierarchy management for phase processing | Michel Cote | 2005-12-20 |
| 6968527 | High yield reticle with proximity effect halos | — | 2005-11-22 |
| 6961186 | Contact printing using a magnified mask image | Alfred Wong | 2005-11-01 |
| 6954911 | Method and system for simulating resist and etch edges | — | 2005-10-11 |
| 6918104 | Dissection of printed edges from a fabrication layout for correcting proximity effects | Youping Zhang | 2005-07-12 |
| 6917411 | Method for optimizing printing of an alternating phase shift mask having a phase shift error | Nanseng Jeng | 2005-07-12 |
| 6880135 | Method of incorporating lens aberration information into various process flows | Fang-Cheng Chang, J. Weed | 2005-04-12 |
| 6866971 | Full phase shifting mask in damascene process | — | 2005-03-15 |
| 6861204 | Design and layout of phase shifting photolithographic masks | Michel Cote | 2005-03-01 |
| 6852471 | Exposure control for phase shifting photolithographic masks | Michel Cote | 2005-02-08 |
| 6846617 | Facilitating optical proximity effect correction through pupil filtering | — | 2005-01-25 |