Issued Patents 2005
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6972836 | Measuring method of illuminance unevenness of exposure apparatus, correcting method of illuminance unevenness, manufacturing method of semiconductor device, and exposure apparatus | Kazuya Sato, Satoshi Tanaka | 2005-12-06 |
| 6967719 | Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor device | Takashi Sato, Shoji Mimotogi, Takahiro Ikeda | 2005-11-22 |
| 6964031 | Mask pattern generating method and manufacturing method of semiconductor apparatus | Toshiya Kotani, Satoshi Tanaka, Sachiko Kobayashi, Hirotaka Ichiakwa | 2005-11-08 |
| 6919153 | Dose monitoring method and manufacturing method of semiconductor device | Tadahito Fujisawa, Takashi Sato, Masafumi Asano | 2005-07-19 |
| 6901577 | Pattern forming method and semiconductor device manufactured by using said pattern forming method | Toshiya Kotani, Satoshi Tanaka | 2005-05-31 |
| 6866976 | Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit | Masafumi Asano, Nobuhiro Komine | 2005-03-15 |
| 6853743 | Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium | Toshiya Kotani, Satoshi Tanaka | 2005-02-08 |