Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6942816 | Methods of reducing photoresist distortion while etching in a plasma processing system | Camelia Rusu | 2005-09-13 |
| 6872281 | Chamber configuration for confining a plasma | Jian J. Chen, Eric H. Lenz | 2005-03-29 |