Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6872663 | Method for reworking a multi-layer photoresist following an underlayer development | — | 2005-03-29 |
| 6846749 | N-containing plasma etch process with reduced resist poisoning | Calvin T. Gabriel, Ramkumar Subramanian | 2005-01-25 |