Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6864184 | Method for reducing critical dimension attainable via the use of an organic conforming layer | — | 2005-03-08 |
| 6846749 | N-containing plasma etch process with reduced resist poisoning | Lynne A. Okada, Ramkumar Subramanian | 2005-01-25 |