Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6872323 | In situ plasma process to remove fluorine residues from the interior surfaces of a CVD reactor | William Robert Entley, Randy K. Hall | 2005-03-29 |
| 6837250 | CVD chamber cleaning using mixed PFCs from capture/recycle | Andrew David Johnson | 2005-01-04 |