Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6869876 | Process for atomic layer deposition of metal films | David A. Roberts, Melanie Boze | 2005-03-22 |
| 6846515 | Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Aaron Scott Lukas, Manchao Xiao | 2005-01-25 |
| 6838573 | Copper CVD precursors with enhanced adhesion properties | Morteza Farnia, Robert Sam Zorich, James Richard Thurmond | 2005-01-04 |