Issued Patents 2004
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6784005 | Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts | Huan-Tai Lin, Shinn-Sheng Yu | 2004-08-31 |
| 6774044 | Reducing photoresist shrinkage via plasma treatment | Chih-Ming Ke, Tsai-Sheng Giau, Jaw-Jung Shin | 2004-08-10 |
| 6768538 | Photolithography system to increase overlay accuracy | Tsai-Sheng Gau | 2004-07-27 |
| 6720116 | Process flow and pellicle type for 157 nm mask making | San-De Tzu, Chung-Hsing Chang, Chen-Hao Hsieh | 2004-04-13 |