Issued Patents 2004
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835529 | Polymer having butadiene sulfone repeating unit and resist composition comprising the same | Sang-jun Choi, Woo-Sung Han | 2004-12-28 |
| 6803176 | Methods for forming line patterns in semiconductor substrates | Sang-jun Choi, Yool Kang, Joo-tae Moon, Jeong-hee Chung | 2004-10-12 |
| 6800418 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | Kwang-Sub Yoon, Ki Yong Song, Sang-jun Choi | 2004-10-05 |
| 6787287 | Photosensitive polymers and resist compositions comprising the photosensitive polymers | Hyun-Woo Kim, Yool Kang | 2004-09-07 |
| 6713228 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | Hyun-Woo Kim, Sung Ho Lee | 2004-03-30 |
| 6696217 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | Kwang-Sub Yoon | 2004-02-24 |
| 6677100 | Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same | Hyun-Woo Kim | 2004-01-13 |