Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800418 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | Ki Yong Song, Sang-jun Choi, Sang-Gyun Woo | 2004-10-05 |
| 6696217 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | Sang-Gyun Woo | 2004-02-24 |