Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6824932 | Self-aligned alternating phase shift mask patterning process | Carlos A. Fonseca, Michael S. Hibbs, Lars Liebmann | 2004-11-30 |
| 6777147 | Method for evaluating the effects of multiple exposure processes in lithography | Carlos A. Fonseca, Kafai Lai | 2004-08-17 |