Issued Patents 2004
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6824932 | Self-aligned alternating phase shift mask patterning process | Scott Bukofsky, Michael S. Hibbs, Lars Liebmann | 2004-11-30 |
| 6795961 | Priority coloring for VLSI designs | Lars Liebmann, Ioana Graur, Young Ouk Kim | 2004-09-21 |
| 6777147 | Method for evaluating the effects of multiple exposure processes in lithography | Scott Bukofsky, Kafai Lai | 2004-08-17 |
| 6757886 | Alternating phase shift mask design with optimized phase shapes | Lars Liebmann, Ioana Graur, Mark A. Lavin | 2004-06-29 |