Issued Patents 2004
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6735492 | Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settings | Edward W. Conrad, John S. Smyth, David A. Ziemer | 2004-05-11 |
| 6694498 | Feed-forward lithographic overlay offset method and system | Edward W. Conrad, Charles J. Parrish | 2004-02-17 |
| 6674516 | Method of photolithographic exposure dose control as a function of resist sensitivity | Keith J. Machia, Matthew Nicholls, Charles J. Parrish, Craig E. Schneider | 2004-01-06 |