Issued Patents 2004
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6821897 | Method for copper CMP using polymeric complexing agents | David Schroeder, Phillip W. Carter, Jeffrey P. Chamberlain, Kyle Miller | 2004-11-23 |
| 6811474 | Polishing composition containing conducting polymer | Jian Zhang, Fred Sun, Shumin Wang, Eric Howard Klingenberg | 2004-11-02 |
| 6776810 | Anionic abrasive particles treated with positively charged polyelectrolytes for CMP | Phillip W. Carter, Jeffrey P. Chamberlain, Kevin Moeggenborg, David W. Boldridge | 2004-08-17 |
| 6705926 | Boron-containing polishing system and method | Renjie Zhou, Steven Grumbine | 2004-03-16 |
| 6685540 | Polishing pad comprising particles with a solid core and polymeric shell | Sriram Anjur, Steven Grumbine | 2004-02-03 |