MB

Marcus Boonman

AB Asml Netherlands B.V.: 2 patents #19 of 157Top 15%
Overall (2004): #52,451 of 270,089Top 20%
2
Patents 2004

Issued Patents 2004

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6741331 Lithographic apparatus with improved exposure area focus, device manufacturing method, and device manufactured thereby Johannes Catharinus Hubertus Mulkens, Hans Butler 2004-05-25
6674510 Off-axis levelling in lithographic projection apparatus Johannes Christiaan Maria Jasper, Erik Roelof Loopstra, Theodorus Marinus Modderman, Gerrit Johannes Nijmeijer, Nicolaas Antonius Allegondus Johannes Van Asten +5 more 2004-01-06