Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6553335 | Method and apparatus for determining end-point in a chamber cleaning process | Jim-Jey Huang, Tain-Chen Hu | 2003-04-22 |
| 6524959 | Chemical mechanical polish (CMP) planarizing method employing derivative signal end-point monitoring and control | Chen-Fa Lu, Chen-Peng Fan, Tien-Chen Hu | 2003-02-25 |