TW

Takeru Watanabe

SC Shin-Etsu Chemical Co.: 14 patents #4 of 245Top 2%
📍 Joetsu, JP: #4 of 35 inventorsTop 15%
Overall (2003): #585 of 273,478Top 1%
14
Patents 2003

Issued Patents 2003

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
6670498 Ester compounds, polymers, resist compositions and patterning process Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2003-12-30
6667145 Resist composition and patterning process Tsunehiro Nishi, Takeshi Kinsho, Koji Hasegawa, Tomohiro Kobayashi, Jun Hatakeyama 2003-12-23
6660448 Polymer, resist composition and patterning process Seiichiro Tachibana, Mutsuo Nakashima, Tsunehiro Nishi, Takeshi Kinsho, Koji Hasegawa +1 more 2003-12-09
6596463 Ester compounds, polymers, resist compositions and patterning process Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2003-07-22
6586157 Ester compounds, polymers, resist compositions and patterning process Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2003-07-01
6566037 Polymer, resist composition and patterning process Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho, Jun Hatakeyama 2003-05-20
6566038 Polymers, resist compositions and patterning process Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa +1 more 2003-05-20
6531627 Ester compounds, polymers, resist compositions and patterning process Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2003-03-11
6524765 Polymer, resist composition and patterning process Tsunehiro Nishi, Jun Hatakeyama, Takeshi Kinsho, Koji Hasegawa, Seiichiro Tachibana 2003-02-25
6517994 Lactone ring-containing (meth)acrylate and polymer thereof for photoresist composition 2003-02-11
6515150 Cyclic acetal compound, polymer, resist composition and patterning process Mutsuo Nakashima, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa, Tsunehiro Nishi +1 more 2003-02-04
6515149 Acetal compound, polymer, resist composition and patterning response Takeshi Kinsho, Koji Hasegawa, Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2003-02-04
6509135 Polymer, resist composition and patterning process Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho, Jun Hatakeyama 2003-01-21
6509481 Tetrahydrofuran compounds having alicyclic structure Takeshi Kinsho, Koji Hasegawa 2003-01-21