Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6620565 | Electron beam lithography apparatus focused through spherical aberration introduction | Eric Munro, John Rouse, Warren K. Waskiewicz, Xieqing Zhu | 2003-09-16 |
| 6528799 | Device and method for suppressing space charge induced aberrations in charged-particle projection lithography systems | James A. Liddle, Masis Mkrtchyan, Stuart Stanton | 2003-03-04 |