Issued Patents 2003
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6583026 | Process for forming a low k carbon-doped silicon oxide dielectric material on an integrated circuit structure | Derryl D. J. Allman, Hemanshu Bhatt | 2003-06-24 |
| 6566186 | Capacitor with stoichiometrically adjusted dielectric and method of fabricating same | Derryl D. J. Allman, Nabil Mansour | 2003-05-20 |
| 6562700 | Process for removal of resist mask over low k carbon-doped silicon oxide dielectric material of an integrated circuit structure, and removal of residues from via etch and resist mask removal | Sam Gu, David Pritchard, Derryl D. J. Allman, Steve Reder | 2003-05-13 |
| 6562735 | Control of reaction rate in formation of low k carbon-containing silicon oxide dielectric material using organosilane, unsubstituted silane, and hydrogen peroxide reactants | Derryl D. J. Allman | 2003-05-13 |