Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6555829 | High precision flexure stage | James Spallas, Lawrence P. Muray, Ho Seob Kim, Tai-Hon Philip Chang | 2003-04-29 |
| 6521901 | System to reduce heat-induced distortion of photomasks during lithography | Bassam Shamoun | 2003-02-18 |