TE

Tjarko Adriaan Rudolf Van Empel

AB Asml Netherlands B.V.: 1 patents #20 of 64Top 35%
Overall (2003): #102,314 of 273,478Top 40%
1
Patents 2003

Issued Patents 2003

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6542220 Purge gas systems for use in lithographic projection apparatus Raymond Laurentius Johannes Schrijver, Marcel Koenraad Marie Baggen, Bernardus Antonius Johannes Luttikhuis, Yim-Bun Patrick Kwan, Erik Roelof Loopstra 2003-04-01