Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6423648 | Controllable oxidation technique for the formation of high-quality ultra-thin gate oxide using carbon dioxide as the oxidizing agent | Ming-Jang Hwang, Paul Tiner | 2002-07-23 |
| 6420729 | Process to produce ultrathin crystalline silicon nitride on Si (111) for advanced gate dielectrics | Robert M. Wallace, Glen Wilk, Yi Wei | 2002-07-16 |
| 6399445 | Fabrication technique for controlled incorporation of nitrogen in gate dielectric | Srikanth Krishnan, Robert J. Kraft | 2002-06-04 |
| 6352941 | Controllable oxidation technique for high quality ultrathin gate oxide formation | Ming-Jang Hwang, Paul Tiner | 2002-03-05 |