Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6417096 | Method for avoiding photo residue in dual damascene with acid treatment | Anseime Chen, Jun Maeda, Sheng-Yueh Chang | 2002-07-09 |
| 6355568 | Cleaning method for copper dual damascene process | Chan-Lon Yang | 2002-03-12 |