Issued Patents 2002
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6492097 | Process for increasing a line width window in a semiconductor process | Chieh-Ming Wang, I-Hsiung Huang | 2002-12-10 |
| 6489085 | Thermal reflow photolithographic process | I-Hsiung Huang, Anderson Chang, Chien-Wen Lai | 2002-12-03 |
| 6444410 | Method of improving photoresist profile | I-Hsiung Huang, Chieh-Ming Wang | 2002-09-03 |
| 6420791 | Alignment mark design | Chien-Chao Huang, Shih-Che Wang | 2002-07-16 |
| 6417096 | Method for avoiding photo residue in dual damascene with acid treatment | Jun Maeda, Sheng-Yueh Chang, Sung-Hsiung Wang | 2002-07-09 |
| 6350681 | Method of forming dual damascene structure | Chingfu Lin, Yi-Fang Cheng, I-Hsiung Huang | 2002-02-26 |