Issued Patents 2002
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6391792 | Multi-step chemical mechanical polish (CMP) planarizing method for forming patterned planarized aperture fill layer | Syun-Ming Jang, Chung-Long Chang | 2002-05-21 |
JC
Juing-Yi Cheng
Overall (2002): #182,948 of 266,432Top 70%
1
Patents 2002