Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6489216 | Chemical mechanical polish (CMP) planarizing method employing topographic mark preservation | Ruei-Je Shiu | 2002-12-03 |
| 6468904 | RPO process for selective CoSix formation | Fu-Mei Chiu, Lin-June Wu | 2002-10-22 |
| 6429142 | In-situ photoresist removal by an attachable chamber with light source | Chiang-Jen Peng | 2002-08-06 |