Issued Patents 2002
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6489216 | Chemical mechanical polish (CMP) planarizing method employing topographic mark preservation | Dian-Hau Chen | 2002-12-03 |
RS
Ruei-Je Shiu
Overall (2002): #124,144 of 266,432Top 50%
1
Patents 2002