Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6469197 | Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2002-10-22 |
| 6391529 | (Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2002-05-21 |
| 6352813 | Photosensitive resin composition and patterning method using the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2002-03-05 |