Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6469197 | Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same | Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano | 2002-10-22 |
| 6437052 | Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same | Shigeyuki Iwasa, Katsumi Maeda | 2002-08-20 |
| 6391529 | (Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition | Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano | 2002-05-21 |
| 6352813 | Photosensitive resin composition and patterning method using the same | Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa | 2002-03-05 |