Issued Patents 2002
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6472280 | Method for forming a spacer for semiconductor manufacture | Nanseng Jeng | 2002-10-29 |
| 6463403 | System and method for process matching | James Burdorf | 2002-10-08 |
| 6453457 | Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout | Youping Zhang | 2002-09-17 |
| 6440862 | Stepped photoresist profile and opening formed using the profile | Shubneesh Batra | 2002-08-27 |
| 6432619 | Method for reducing photolithographic steps in a semiconductor interconnect process | Nanseng Jeng | 2002-08-13 |
| 6424882 | Method for patterning and fabricating wordlines | — | 2002-07-23 |
| 6421111 | Multiple image reticle for forming layers | — | 2002-07-16 |
| 6418008 | Enhanced capacitor shape | Mark E. Jost, William A. Stanton | 2002-07-09 |
| 6391709 | Enhanced capacitor shape | Mark E. Jost, William A. Stanton | 2002-05-21 |
| 6379847 | Electrically programmable photolithography mask | Douglas J. Cutter | 2002-04-30 |
| 6374396 | Correction of field effects in photolithography | Bill Baggenstoss | 2002-04-16 |
| 6373976 | Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems | Baorui Yang | 2002-04-16 |
| 6369432 | Enhanced capacitor shape | Mark E. Jost, William A. Stanton | 2002-04-09 |
| 6337172 | Method for reducing photolithographic steps in a semiconductor interconnect process | Nanseng Jeng | 2002-01-08 |