Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6461972 | Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow | — | 2002-10-08 |
| 6346488 | Process to provide enhanced resistance to cracking and to further reduce the dielectric constant of a low dielectric constant dielectric film of an integrated circuit structure by implantation with hydrogen ions | — | 2002-02-12 |
| 6346490 | Process for treating damaged surfaces of low k carbon doped silicon oxide dielectric material after plasma etching and plasma cleaning steps | Wilbur G. Catabay, Wei-Jen Hsia | 2002-02-12 |