Issued Patents 2002
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6387782 | Process of forming an ultra-shallow junction dopant layer having a peak concentration within a dielectric layer | Hiroyuki Akatsu, Suryanarayan G. Hegde, Yujun Li, Rajesh Rengarajan, Paul A. Ronsheim | 2002-05-14 |