Issued Patents 2002
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6492441 | Anti reflective coating polymers and the preparation method thereof | Sung-Eun Hong, Min Ho Jung, Hyeong Soo Kim | 2002-12-10 |
| 6489432 | Organic anti-reflective coating polymer and preparation thereof | Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Geun Su Lee | 2002-12-03 |
| 6489423 | Organic anti-reflective polymer and method for manufacturing thereof | Min Ho Jung, Sung-Eun Hong | 2002-12-03 |
| 6486283 | Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2002-11-26 |
| 6482565 | Photoresist cross-linker and photoresist composition comprising the same | Jae Chang Jung, Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim | 2002-11-19 |
| 6465147 | Cross-linker for photoresist, and process for forming a photoresist pattern using the same | Geun Su Lee, Jae Chang Jung, Min Ho Jung | 2002-10-15 |
| 6455226 | Photoresist polymers and photoresist composition containing the same | Geun Su Lee, Jae Chang Jung, Hyeong Soo Kim | 2002-09-24 |
| 6455225 | Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same | Keun Kyu Kong, Jae Chang Jung, Geun Su Lee | 2002-09-24 |
| 6448352 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2002-09-10 |
| 6426171 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2002-07-30 |
| 6423797 | Anti-reflective coating polymers from p-tosylmethylacrylamide and preparation method | Sung-Eun Hong, Min Ho Jung | 2002-07-23 |
| 6416926 | Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | Jae Chang Jung, Chi Hyeong Roh, Min Ho Jung, Geun Su Lee | 2002-07-09 |
| 6410670 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Min Ho Jung | 2002-06-25 |
| 6403281 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Geun Su Lee, Jae Chang Jung | 2002-06-11 |
| 6399792 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Jae Chang Jung, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim | 2002-06-04 |
| 6399272 | Phenylenediamine derivative-type additive useful for a chemically amplified photoresist | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Min Ho Jung | 2002-06-04 |
| 6395397 | Organic anti-reflective coating polymer and preparation thereof | Sung-Eun Hong, Min Ho Jung | 2002-05-28 |
| 6395451 | Photoresist composition containing photo base generator with photo acid generator | Jae Chang Jung, Keun Kyu Kong, Jin-Soo Kim | 2002-05-28 |
| 6391518 | Polymers and photoresist compositions using the same | Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2002-05-21 |
| 6388039 | Organic anti-reflective polymer and method for manufacturing thereof | Min Ho Jung, Sung-Eun Hong | 2002-05-14 |
| 6387589 | Photoresist polymers and photoresist compositions containing the same | Cha-Won Koh, Geun Su Lee | 2002-05-14 |
| 6376632 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Jae Chang Jung, Min Ho Jung, Cheol Kyu Bok | 2002-04-23 |
| 6372935 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok | 2002-04-16 |
| 6368770 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2002-04-09 |
| 6369181 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok | 2002-04-09 |