Issued Patents 2002
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6489432 | Organic anti-reflective coating polymer and preparation thereof | Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2002-12-03 |
| 6486283 | Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-11-26 |
| 6482565 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik | 2002-11-19 |
| 6465147 | Cross-linker for photoresist, and process for forming a photoresist pattern using the same | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2002-10-15 |
| 6455225 | Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same | Keun Kyu Kong, Geun Su Lee, Ki Ho Baik | 2002-09-24 |
| 6455226 | Photoresist polymers and photoresist composition containing the same | Geun Su Lee, Hyeong Soo Kim, Ki Ho Baik | 2002-09-24 |
| 6448352 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-09-10 |
| 6426171 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-07-30 |
| 6416926 | Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | Chi Hyeong Roh, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-07-09 |
| 6410670 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2002-06-25 |
| 6403281 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Geun Su Lee, Ki Ho Baik | 2002-06-11 |
| 6403287 | Process for forming a photoresist pattern improving resistance to post exposure delay effect | Jin-Soo Kim, Hyoung Gi Kim | 2002-06-11 |
| 6399792 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik | 2002-06-04 |
| 6399272 | Phenylenediamine derivative-type additive useful for a chemically amplified photoresist | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2002-06-04 |
| 6395451 | Photoresist composition containing photo base generator with photo acid generator | Keun Kyu Kong, Jin-Soo Kim, Ki Ho Baik | 2002-05-28 |
| 6391518 | Polymers and photoresist compositions using the same | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-05-21 |
| 6376632 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-23 |
| 6372935 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-16 |
| 6368770 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-04-09 |
| 6369181 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-09 |
| 6368773 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik +1 more | 2002-04-09 |
| 6368771 | Photoresist polymers and photoresist compositions containing the same | Cha-Won Koh, Geun Su Lee, Myoung Soo Kim | 2002-04-09 |
| 6359153 | Photoresist monomers and preparation thereof | Geun Su Lee, Chang-Il Choi, Hyeong Soo Kim, Jin-Soo Kim, Min Ho Jung +1 more | 2002-03-19 |