Issued Patents 2002
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6410670 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2002-06-25 |
| 6399272 | Phenylenediamine derivative-type additive useful for a chemically amplified photoresist | Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2002-06-04 |
| 6387589 | Photoresist polymers and photoresist compositions containing the same | Geun Su Lee, Ki Ho Baik | 2002-05-14 |
| 6368771 | Photoresist polymers and photoresist compositions containing the same | Geun Su Lee, Jae Chang Jung, Myoung Soo Kim | 2002-04-09 |
| 6348296 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Hyung Gi Kim | 2002-02-19 |