Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6468718 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Takanori Kudo, Georg Pawlowski | 2002-10-22 |
| 6465148 | Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom | Ken Kimura, Shoko Matsuo, Yoshinori Nishiwaki, Hatsuyuki Tanaka | 2002-10-15 |
| 6465161 | Method for forming resist pattern | Shoko Matsuo, Ken Kimura, Yoshinori Nishiwaki, Hatsuyuki Tanaka | 2002-10-15 |
| 6361917 | Process for patterning poly(arylenevinylene) polymer films by irradiation with light | Nu Yu, Akihiko Tokida | 2002-03-26 |